High rate dry etching of InGaZnO by BCl3/O2 plasma

Park, Wanjae, Whang, Ki-Woong, Gwang Yoon, Young, Hwan Kim, Jeong, Rha, Sang-Ho, Seong Hwang, Cheol

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Volume:

Year:

2011

Language:

english

Journal:

Applied Physics Letters

DOI:

10.1063/1.3624594

File:

PDF, 568 KB

english, 2011

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