Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2011 Vol. 29; Iss. 1
Investigation of the radiation-induced thermal flexure of an x-ray lithography mask during a tilted exposure
Nazmov, V., Reznikova, E., Mohr, J.Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3524905
File:
PDF, 704 KB
english, 2011