High Quality of Ultra-Thin SiO x...

Materials and Manufacturing Processes 2014 / 09 Vol. 29; Iss. 9

High Quality of Ultra-Thin SiO x N y Films Prepared in Nitrous Oxide Ambients Using Thermal Low-Pressure Oxynitridation

Liu, GuoZhu, Hong, GenShen, Zheng, RuoCheng, Wu, XiaoDong, Yang, WenJun
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Volume:
29
Language:
english
Journal:
Materials and Manufacturing Processes
DOI:
10.1080/10426914.2014.921692
Date:
September, 2014
File:
PDF, 1.01 MB
english, 2014
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