Reactive magnetron sputtering of hard Si–B–C–N films with a high-temperature oxidation resistance
Vlček, Jaroslav, Potocký, Štěpán, Čížek, Jiří, Houška, Jiří, Kormunda, Martin, Zeman, Petr, Peřina, Vratislav, Zemek, Josef, Setsuhara, Yuichi, Konuma, SeijiVolume:
23
Year:
2005
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2049298
File:
PDF, 704 KB
english, 2005