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Amorphous silicide formation by thermal reaction: A comparison of several metal–silicon systems
Holloway, KarenVolume:
7
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.576081
Date:
May, 1989
File:
PDF, 1.04 MB
english, 1989