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Effect of a mid-temperature thermal annealing on the enhancement of boron diffusion during rapid thermal annealing
Léve^que, P., Mathiot, D., Christensen, J. S., Svensson, B. G., Larsen, A. NylandstedVolume:
99
Year:
2006
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2183583
File:
PDF, 321 KB
english, 2006