Uniaxial and biaxial strain field dependence of the thermal...

Journal of Applied Physics 2001 Vol. 90; Iss. 10

Uniaxial and biaxial strain field dependence of the thermal oxidation rate of silicon

Noma, Hirokazu, Takahashi, Hiroyuki, Fujioka, Hiroshi, Oshima, Masahara, Baba, Yuji, Hirose, Kazuyuki, Niwa, Masaaki, Usuda, Koji, Hirashita, Norio
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Volume:
90
Year:
2001
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1413229
File:
PDF, 427 KB
english, 2001
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