Substrate heating influence on the deposition rate of oxides during pulsed laser deposition in ambient gas
Amoruso, S., Aruta, C., Bruzzese, R., Wang, X., Scotti di Uccio, U.Volume:
98
Year:
2011
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.3565157
File:
PDF, 306 KB
english, 2011