Characterization of 100 MHz inductively coupled plasma...

Characterization of 100 MHz inductively coupled plasma (ICP) by comparison with 13.56 MHz ICP

Nakagawa, H., Morishita, S., Noda, S., Okigawa, M., Inoue, M., Sekine, M., Ito, K.

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Volume:

Year:

1999

Language:

english

Journal:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

DOI:

10.1116/1.581845

File:

PDF, 564 KB

english, 1999

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