Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1990 / 11 Vol. 8; Iss. 6
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Charging effects on trilevel resist with an e-beam lithography system
Itoh, HiroyukiVolume:
8
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.585180
Date:
November, 1990
File:
PDF, 722 KB
english, 1990