Stress-induced nucleation of voids in narrow aluminum-based...

Journal of Applied Physics 1991 Vol. 70; Iss. 11

Stress-induced nucleation of voids in narrow aluminum-based metallizations on silicon substrates

Korhonen, M. A., LaFontaine, W. R., Bo̸rgesen, P., Li, Che-Yu
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Volume:
70
Year:
1991
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.349852
File:
PDF, 1.30 MB
english, 1991
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