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Forming gas annealing on physical characteristics and electrical properties of Sr[sub 0.8]Bi[sub 2]Ta[sub 2]O[sub 9]/Al[sub 2]O[sub 3]/Si capacitors
Lan, Bang Chiang, Hsu, Jung-Jui, Chen, San-Yuan, Bow, Jong-ShingVolume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1588362
File:
PDF, 579 KB
english, 2003