Thermal behavior of Al and Al-3 at. % Ge thin films on Si...

Journal of Applied Physics 1993 Vol. 74; Iss. 4

Thermal behavior of Al and Al-3 at. % Ge thin films on Si wafers

Lim, B. S., Pritchet, W. C., Rodbell, K. P., Tu, K. N.
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Volume:
74
Year:
1993
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.354623
File:
PDF, 599 KB
english, 1993
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