CoSi[sub x] contact resistance after etching and ashing...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2009 Vol. 27; Iss. 4

CoSi[sub x] contact resistance after etching and ashing plasma exposure

Katahira, Ken, Fukasawa, Masanaga, Kobayashi, Shoji, Takizawa, Toshifumi, Isobe, Michio, Hamaguchi, Satoshi, Nagahata, Kazunori, Tatsumi, Tetsuya
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Volume:
27
Year:
2009
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3130146
File:
PDF, 1.20 MB
english, 2009
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