Study of C[sub 4]F[sub 8]/N[sub 2] and C[sub 4]F[sub 8]/Ar/N[sub 2] plasmas for highly selective organosilicate glass etching over Si[sub 3]N[sub 4] and SiC
Hua, Xuefeng, Wang, X., Fuentevilla, D., Oehrlein, G. S., Celii, F. G., Kirmse, K. H. R.Volume:
21
Year:
2003
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1598973
File:
PDF, 585 KB
english, 2003