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A 3-dimensional model for low-pressure chemical-vapor-deposition step coverage in trenches and circular vias
IslamRaja, M. Mazhar, Cappelli, M. A., McVittie, J. P., Saraswat, K. C.Volume:
70
Year:
1991
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.349797
File:
PDF, 765 KB
english, 1991