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Boron redistribution in arsenic-implanted silicon and...

Boron redistribution in arsenic-implanted silicon and short-channel effects in metal–oxide–semiconductor field effect transistors

Sadana, D. K., Acovic, A., Davari, B., Grutzmacher, D., Hanafi, H., Cardone, F.
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Volume:
61
Year:
1992
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.108002
File:
PDF, 595 KB
english, 1992
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