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In situ infrared measurements of film and gas properties during the plasma deposition of amorphous hydrogenated silicon
Morrison, Philip W., Haigis, John R.Volume:
11
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.578761
Date:
May, 1993
File:
PDF, 1.36 MB
english, 1993