Ex situ tunnel junction process technique characterized by...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2010 Vol. 28; Iss. 5

Ex situ tunnel junction process technique characterized by Coulomb blockade thermometry

Prunnila, M., Meschke, M., Gunnarsson, D., Enouz-Vedrenne, S., Kivioja, J. M., Pekola, J. P.
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Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3490406
File:
PDF, 1.17 MB
english, 2010
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