High rate deposition of photocatalytic TiO[sub 2] films by...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2008 Vol. 26; Iss. 4

High rate deposition of photocatalytic TiO[sub 2] films by dc magnetron sputtering using a TiO[sub 2−x] target

Sato, Yasushi, Uebayashi, Akira, Ito, Norihiro, Kamiyama, Toshihisa, Shigesato, Yuzo
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Volume:
26
Year:
2008
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2870226
File:
PDF, 722 KB
english, 2008
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