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Preparation and stability of low temperature cobalt and nickel silicides on thin polysilicon films
Howell, R. S., Sarcona, G., Saha, S. K., Hatalis, M. K.Volume:
18
Year:
2000
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.582123
File:
PDF, 374 KB
english, 2000