Relaxation of misfit strain in silicon-germanium (Si[sub...

Relaxation of misfit strain in silicon-germanium (Si[sub 1−x]Ge[sub x]) films during dry oxidation

Yoo, Jung-Ho, Kim, Sun-Wook, Min, Byoung-Gi, Sohn, Hyunchul, Ko, Dae-Hong, Cho, Mann-Ho
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Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3516014
File:
PDF, 564 KB
english, 2010
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