Controlling Ambient Gas in Slot-to-Slot Space Inside FOUP...

IEEE Transactions on Semiconductor Manufacturing 2008 / 11 Vol. 21; Iss. 4

Controlling Ambient Gas in Slot-to-Slot Space Inside FOUP to Suppress Cu-Loss After Dual Damascene Patterning

Kamoshima, Takao, Fujii, Yasuhisa, Noguchi, Toshimitsu, Saeki, Tomonori, Takata, Yoshifumi, Ochi, Hironori, Koiwa, Akira
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Volume:
21
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2008.2005343
Date:
November, 2008
File:
PDF, 1.25 MB
english, 2008
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