Admittance of Al/GaAs Schottky contacts under forward bias as a function of interface preparation conditions
Muret, P., Elguennouni, D., Missous, M., Rhoderick, E. H.Volume:
58
Year:
1991
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.104958
File:
PDF, 607 KB
english, 1991