Effects of copper and oxygen precipitation during thermal oxidation of silicon: An electron-beam-induced current study
Correia, A., Ballutaud, D., Boutry-Forveille, A., Maurice, J.-L.Volume:
78
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.360475
File:
PDF, 1.83 MB
english, 1995