Threshold energy density for pulsed-laser annealing of...

Threshold energy density for pulsed-laser annealing of ion-implanted silicon

Hoonhout, D.
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Volume:
53
Year:
1982
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.331219
File:
PDF, 1.11 MB
english, 1982
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