Formation of epitaxial CoSi[sub 2] by a Cr or Mo...

Journal of Applied Physics 2001 Vol. 89; Iss. 4

Formation of epitaxial CoSi[sub 2] by a Cr or Mo interlayer: Comparison with a Ti interlayer

Detavernier, C., Van Meirhaeghe, R. L., Cardon, F., Maex, K., Bender, H., Brijs, B., Vandervorst, W.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
89
Year:
2001
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1340598
File:
PDF, 515 KB
english, 2001
Conversion to is in progress
Conversion to is failed