Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2011 Vol. 29; Iss. 2
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Fabrication of metal nanowires by ion-beam irradiation of oxides through high aspect ratio resist masks
Gurovich, B. A., Prikhod’ko, K. E., Taldenkov, A. N., Chumakov, N. K., Fedorov, G. E., Yakubovsky, A. Yu., Bogdanov, A. L.Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3548875
File:
PDF, 814 KB
english, 2011