Chemical sputtering of nickel oxide and carbide by low...

The Journal of Chemical Physics 1987 Vol. 86; Iss. 6

Chemical sputtering of nickel oxide and carbide by low energy (5–200 eV) C+ and O+ beams

Kang, Heon, Kasi, Srinandan, Rabalais, J. Wayne
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Volume:
86
Year:
1987
Language:
english
Journal:
The Journal of Chemical Physics
DOI:
10.1063/1.451978
File:
PDF, 481 KB
english, 1987
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