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Band alignment issues related to HfO[sub 2]∕SiO[sub 2]∕p-Si gate stacks
Sayan, S., Emge, T., Garfunkel, E., Zhao, Xinyuan, Wielunski, L., Bartynski, R. A., Vanderbilt, David, Suehle, J. S., Suzer, S., Banaszak-Holl, M.Volume:
96
Year:
2004
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1803107
File:
PDF, 389 KB
english, 2004