Electrical properties of the TiSi2–Si transition region in...

Journal of Applied Physics 2001 Vol. 90; Iss. 5

Electrical properties of the TiSi2–Si transition region in contacts: The influence of an interposed layer of Nb

Åberg, J., Persson, S., Hellberg, P.-E., Zhang, S.-L., Smith, U., Ericson, F., Engström, M., Kaplan, W.
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Volume:
90
Year:
2001
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1384486
File:
PDF, 765 KB
english, 2001
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