Study on characteristics of thermally stable HfLaON gate...

Applied Physics Letters 2008 Vol. 93; Iss. 25

Study on characteristics of thermally stable HfLaON gate dielectric with TaN metal gate

Xu, Qiuxia, Xu, Gaobo, Wang, Wenwu, Chen, Dapeng, Shi, Shali, Han, Zhengsheng, Ye, Tianchun
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Volume:
93
Year:
2008
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.3050522
File:
PDF, 473 KB
english, 2008
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