W chemical-vapor deposition using (i-C[sub 3]H[sub 7]C[sub...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2008 Vol. 26; Iss. 4

W chemical-vapor deposition using (i-C[sub 3]H[sub 7]C[sub 5]H[sub 4])[sub 2]WH[sub 2]

Ogura, Atsushi, Imai, Satoshi, Kagawa, Taihei, Kurozaki, Hirotaka, Ishikawa, Masato, Muramoto, Ikuyo, Machida, Hideaki, Ohshita, Yoshio
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Volume:
26
Year:
2008
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2913581
File:
PDF, 458 KB
english, 2008
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