Optical lithography simulation for the whole resist process

Current Applied Physics 2006 Vol. 6; Iss. 1

Optical lithography simulation for the whole resist process

Sang-Kon Kim, Ji-Eun Lee, Seung-Wook Park, Hye-Keun Oh
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Volume:
6
Year:
2006
Language:
english
Pages:
6
Journal:
Current Applied Physics
DOI:
10.1016/j.cap.2004.12.003
File:
PDF, 383 KB
english, 2006
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