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Direct measurement of the etching rates on Si (111) and silicon dioxide surfaces in 40% ammonium fluoride aqueous solution via atomic force microscopy
Ouyang, Jian Hua, Zhao, Xin Sheng, Li, Ting, Zhang, Da ChengVolume:
93
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1559001
File:
PDF, 453 KB
english, 2003