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Design and analysis of the single-step nanoimprinting lithography equipment for sub-100 nm linewidth
JaeJong Lee, Kee-Bong Choi, Gee-Hong KimVolume:
6
Year:
2006
Language:
english
Pages:
5
Journal:
Current Applied Physics
DOI:
10.1016/j.cap.2005.07.007
File:
PDF, 386 KB
english, 2006