High-throughput step-and-repeat UV-nanoimprint lithography

Current Applied Physics 2006 Vol. 6; Iss. supp-S1

High-throughput step-and-repeat UV-nanoimprint lithography

Eung-sug Lee, Jun-ho Jeong, Young-suk Sim, Ki-don Kim, Dae-geun Choi, Jun-hyuk Choi
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Volume:
6
Year:
2006
Language:
english
Pages:
1
Journal:
Current Applied Physics
DOI:
10.1016/j.cap.2006.01.019
File:
PDF, 799 KB
english, 2006
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