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Electron holography analysis of a shallow junction for planar-bulk metal-oxide-semiconductor field-effect transistors approaching the scaling limit
Ikarashi, Nobuyuki, Ikezawa, Takeshi, Uejima, Kazuya, Fukai, Toshinori, Miyamura, Makoto, Toda, Akio, Hane, MasamiVolume:
103
Year:
2008
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2937246
File:
PDF, 557 KB
english, 2008