Low-damage low-k etching with an environmentally friendly...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2008 Vol. 26; Iss. 4

Low-damage low-k etching with an environmentally friendly CF[sub 3]I plasma

Soda, Eiichi, Kondo, Seiichi, Saito, Shuichi, Ichihashi, Yoshinari, Sato, Aiko, Ohtake, Hiroto, Samukawa, Seiji
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Volume:
26
Year:
2008
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2919137
File:
PDF, 1.07 MB
english, 2008
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