Fabrication and annealing effects of SnO2/SiOx nanocables...

Current Applied Physics 2010 Vol. 10; Iss. 1

Fabrication and annealing effects of SnO2/SiOx nanocables sheathed by the sputtering technique

Hyoun Woo Kim, Seung Hyun Shim, Jong Woo Lee, Hyo Sung Kim, Mesfin Abayneh Kebede, Han Gil Na, Ju Chan Yang, Myung Ho Kong, Chongmu Lee
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Volume:
10
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.cap.2009.04.009
File:
PDF, 537 KB
english, 2010
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