![](/img/cover-not-exists.png)
Effect of poly silicon thickness on the formation of Ni-FUSI gate by using atomic layer deposited nickel film
Jong-Bong Ha, Sang-Won Yun, Jung-Hee LeeVolume:
10
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.cap.2009.04.011
File:
PDF, 735 KB
english, 2010