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Diffusion of implanted nitrogen in silicon
Shaik Adam, Lahir, Law, Mark E., Jones, Kevin S., Dokumaci, Omer, Murthy, C. S., Hegde, SuriVolume:
87
Year:
2000
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.372173
File:
PDF, 309 KB
english, 2000