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Electrical properties of HfO2 charge trap flash memory with SiO2/HfO2/Al2O3 engineered tunnel layer
Se-Man Oh, Hee-wook You, Kwan-Su Kim, Young-Hie Lee, Won-Ju ChoVolume:
10
Year:
2010
Language:
english
Pages:
1
DOI:
10.1016/j.cap.2009.12.005
File:
PDF, 328 KB
english, 2010