Subsecond melt processing for achieving SiGe layers

Current Applied Physics 2010 Vol. 10; Iss. 5

Subsecond melt processing for achieving SiGe layers

Matthias Voelskow, Aloke Kanjilal, Wolfgang Skorupa
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Volume:
10
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.cap.2010.03.013
File:
PDF, 603 KB
english, 2010
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