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X-ray photoemission spectroscopy characterization of silicon surfaces after CF4/H2 magnetron ion etching: Comparisons to reactive ion etching
Oehrlein, Gottlieb S.Volume:
6
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.575222
Date:
May, 1988
File:
PDF, 704 KB
english, 1988