Influence of plasma conditions on the defect formation mechanism in amorphous hydrogenated silicon
Kounavis, P., Mataras, D., Spiliopoulos, N., Mytilineou, E., Rapakoulias, D.Volume:
75
Year:
1994
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.356397
File:
PDF, 1.17 MB
english, 1994