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[IEEE 2007 IEEE International Electron Devices Meeting - Washington, DC, USA (2007.12.10-2007.12.12)] 2007 IEEE International Electron Devices Meeting - Mass Production Worthy MIM Capacitor On Gate polysilicon(MIM-COG) Structure using HfO2/HfOxCyNz/HfO2 Dielectric for Analog/RF/Mixed Signal Application
Park, Jung-Min, Song, Min-Woo, Kim, Weon-Hong, Park, Pan-Kwi, Jung, Yong-Kuk, Kim, Ju-Youn, Won, Seok-Jun, Lee, Jong-Ho, Lee, Nae-In, Kang, Ho-KyuYear:
2007
Language:
english
DOI:
10.1109/iedm.2007.4419121
File:
PDF, 1.86 MB
english, 2007