Role of gas feed delivery and dilutent on oxide etching in...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 1998 / 5 Vol. 16; Iss. 3

Role of gas feed delivery and dilutent on oxide etching in an inductively coupled plasma etch system

Lercel, M. J.
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Volume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581169
Date:
May, 1998
File:
PDF, 388 KB
english, 1998
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