Near-edge valence-band structure of amorphous hydrogenated...

Near-edge valence-band structure of amorphous hydrogenated Si–C thin films characterized by Auger and photoemission processes

Lee, Moon-Hwan, Ohuchi, Fumio S.
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Volume:
19
Year:
2001
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1359547
File:
PDF, 391 KB
english, 2001
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