Response to ‘‘Comment on ‘Low-temperature reactive ion...

Applied Physics Letters 1988 Vol. 53; Iss. 17

Response to ‘‘Comment on ‘Low-temperature reactive ion etching and microwave plasma etching of silicon’ ’’ [Appl. Phys. Lett. 53, 1665 (1988)]

Tachi, Shinichi, Tsujimoto, Kazunori, Okudaira, Sadayuki
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Volume:
53
Year:
1988
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.99793
File:
PDF, 446 KB
english, 1988
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